Memory device and memory cell

ABSTRACT

A memory device includes at least one memory cell. The memory cell includes first and second transistors, and first and second capacitors. The first transistor is coupled to a source line. The second transistor is coupled to the first transistor and a bit line. The first capacitor is coupled to a word line and the second transistor. The second capacitor is coupled to the second transistor and an erase gate.

PRIORITY CLAIM

The present application is a divisional of U.S. application Ser. No.14/500,425, filed Sep. 29, 2014, which is incorporated herein byreference in its entirety.

BACKGROUND

Processors and memories are parts of computing systems and electronicdevices. The performance of a memory impacts the overall performance ofthe system or electronic device. Various circuits and/or operatingmethods are developed to improve one or more aspects of memoryperformance, such as access speed, power consumption, read margin,endurance, etc.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a block diagram of a memory device in accordance with someembodiments.

FIG. 2A is a layout of a memory device in accordance with someembodiments.

FIG. 2B is a partial cross-sectional view taken along line A1-A6 in FIG.2A and shows a memory cell in accordance with some embodiments.

FIG. 2C is a circuit diagram of the memory cell in FIG. 2B, inaccordance with some embodiments.

FIGS. 3-5 are cross-sectional views of various memory cells, inaccordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, when a first element is described as being “connected” or“coupled” to a second element, such description includes embodiments inwhich the first and second elements are directly connected or coupled toeach other, and also includes embodiments in which the first and secondelements are indirectly connected or coupled to each other with one ormore other intervening elements in between.

FIG. 1 is a block diagram of a memory device 100 in accordance with someembodiments. The memory device 100 includes a memory array 110, and amemory controller 112. The memory array 110 includes a plurality ofmemory cells MC arranged in a plurality of rows and columns. The memorycells MC in each column are coupled to a corresponding one among aplurality of (k+1) bit lines BL0-BLk. The memory cells MC in each roware coupled to a corresponding one among a plurality of (j+1) word linesWL0-WLj, a corresponding one among a plurality of (j+1) source linesSL0-SLj, a corresponding one among a plurality of (j+1) erase linesE0-Ej, and a corresponding one among a plurality of (j+1) selector linesS0-Sj. Various numbers of word lines and/or bit lines and/or sourcelines and/or erase lines and/or selector lines in the memory array 110are within the scope of various embodiments. In at least one embodiment,the source lines are arranged in the columns, rather than in the rows asshown in FIG. 1.

In one or more embodiments, the memory cells MC include multiple timeprogrammable (MTP) memory cells. Examples of MTP memory include, but arenot limited to, electrically erasable programmable read-only memory(EEPROM), flash memory, etc. In one or more embodiments, the memorycells MC include single-level memory cells each of which is configuredto store 1 bit of data. In at least one embodiment, the memory cells MCinclude multi-level memory cells each of which is configured to store 2or more bits of data. A threshold voltage of a memory cell MC depends ona logic state of data stored in the memory cell MC. For example, for asingle-level memory cell, the threshold voltage when the memory cell isin an erased logic state (i.e., the memory cell stores a logic “1”) islower than when the memory cell is in a programmed state (i.e., thememory cell stores a logic “0”). For a multi-level memory cell, thememory cell has more than two threshold voltages corresponding to morethan two logic states of the multi-level memory cell. The memory cellMCs are switchable between the logic states and have different thresholdvoltages corresponding to the logic states.

The memory controller 112 is configured to detect the threshold voltageof a memory cell MC, in a read operation, to read a datum stored in thememory cell MC. The memory controller 112 is further configured to writea datum, in a write operation, to a memory cell MC. In at least oneembodiment, a write operation includes an erase operation (i.e., write“1”) or a program operation (i.e., write “0”). The memory controller 112includes a word line driver 120, a bit line driver 130, and a sourceline driver 140 to perform a read operation or a write operation. Theword line driver 120 is coupled to the memory array 110 via the wordlines WL0-WLj. The bit line driver 130 is coupled to the memory array110 via the bit lines BL0-BLk. The source line driver 140 is coupled tothe memory array 110 via the source lines SL0-SLj. In at least oneembodiment, the erase lines E0-Ej and/or the selector lines S0-Sj arecoupled to the word line driver 120. Other arrangements are within thescope of various embodiments. In at least one embodiment, the memorycontroller 112 further includes one or more clock generators forproviding clock signals for various components of the memory device 100,one or more input/output (I/O) units for data exchange with externaldevices, one or more sensing amplifiers for sensing data stored in thememory array 110, and/or one or more controllers for controlling variousoperations in the memory device 100. Other memory device configurationsare within the scope of various embodiments. In some embodiments, bycontrolling voltages applied to one or more of the word lines WL0-WLj,bit lines BL0-BLk, source lines SL0-SLj, erase lines E0-Ej and selectorlines S0-Sj, various memory cells MC in the memory device 100 areprogramed, read or erased.

FIG. 2A is a layout of a memory device 200, in accordance with someembodiments. The semiconductor device 200 comprises at least one memorycell. Two memory cells 201 and 202 are shown in FIG. 2A, for example. Inat least one embodiment, each of the memory cells 201 and 201corresponds to a memory cell MC described with respect to FIG. 1. In theexample configuration in FIG. 2A, the memory cell 201 and the memorycell 202 are symmetrical with each other across an axis Z. Otherarrangements are within the scope of various embodiments. The memorycell 201 is described herein, and a detailed description of the memorycell 202 is omitted.

The memory cell 201 comprises conductive patterns 210 and 220, andactive area patterns 230, 240 and 250. The conductive patterns 210 and220 are discrete one from another. The conductive pattern 210 (alsoreferred to herein as floating gate FG) extends continuously over theactive area patterns 230, 240 and 250. The conductive pattern 210includes a first portion 212 over the active area pattern 250, a secondportion 214 over the active area pattern 240, and third portion 216 overthe active area pattern 230. The conductive pattern 220 extends over theactive area pattern 240. In at least one embodiment, the conductivepattern 210 and the conductive pattern 220 belong to the same layer ofconductive material. An example material of the conductive pattern 210and conductive pattern 220 is polysilicon. Other materials are withinthe scope of various embodiments. The conductive pattern 210 andconductive pattern 220 of the memory cell 201, and correspondingconductive patterns (e.g., a floating gate FG') of the memory cell 202are schematically illustrated in FIG. 2A with the label “PO.”

The active area patterns 230, 240 and 250 are discrete one from another.The active area patterns 230, 240 and 250 are also referred to herein as“OD patterns,” i.e., oxide-definition (OD) patterns, and areschematically illustrated in FIG. 2A with the label “OD.” Examplematerials of the active area patterns 230, 240 and 250 include, but arenot limited to, semiconductor materials doped with various types ofp-dopants and/or n-dopants. In at least one embodiment, the active areapatterns 230, 240 and 250 include dopants of the same type. In at leastone embodiment, at least one of the active area patterns 230, 240 and250 includes dopants of a type different from a type of dopants ofanother one of the active area patterns 230, 240 and 250. The activearea patterns 230, 240 and 250 are within corresponding well regions. Inthe example configuration in FIG. 2A, the active area pattern 230 iswithin a well region NW2 which is an n-well, the active area pattern 240is within a well region PW which is a p-well, and the active areapattern 250 is within a well region NW1 which is an n-well. Thedescribed conductivity of the well regions is an example. Otherarrangements are within the scope of various embodiments. The n- andp-wells are schematically illustrated in FIG. 2A with the correspondinglabels “NW” and “PW.”

The active area pattern 230 has the same type of dopants as thecorresponding well region NW2. For example, both the active area pattern230 and the corresponding well region NW2 include n-type dopants. Theactive area pattern 230 and the well region NW2 having the same type ofdopants are configured to form a first electrode of a capacitor C_(EG).A second electrode of the capacitor C_(EG) is configured by the thirdportion 216 of the conductive pattern 210 which extends over the activearea pattern 230 and well region NW2. The third portion 216 of theconductive pattern 210 overlaps the active area pattern 230 and wellregion NW2 in an overlapping area which determines a capacitance of thecapacitor C_(EG). The active area pattern 230 includes regions 232 and234 on opposite sides of the third portion 216 of the conductive pattern210. A conductor EG (also referred to herein as an erase gate EG) isarranged in the region 234 to provide an electrical connection from thefirst electrode of the capacitor C_(EG) to an erase line, such as acorresponding one of the erase lines E0-Ej described with respect toFIG. 1, for erasing the memory cell 201.

The active area pattern 240 has a type of dopants different in type fromthat of the corresponding well region PW. For example, the active areapattern 240 includes n-type dopants, and the corresponding well regionPW includes p-type dopants. The active area pattern 240, the well regionPW, and the conductive pattern 220 extending over the well region PW areconfigured to form a transistor N1, which is a selector transistor ofthe memory cell 201. The active area pattern 240, the well region PW,and the second portion 214 of the conductive pattern 210 extending overthe well region PW are configured to form a transistor N2, which is astorage transistor of the memory cell 201. Examples of the transistorsN1 and N2 include, but are not limited to, metal oxide semiconductorfield effect transistors (MOSFET), complementary metal oxidesemiconductor (CMOS) transistors, bipolar junction transistors (BJT),high voltage transistors, high frequency transistors, p-channel and/orn-channel field effect transistors (PFETs/NFETs), FinFETs, planar MOStransistors with raised source/drains, etc. In at least one embodiment,the transistors N1 and N2 are n-channel metal-oxide semiconductor (NMOS)transistors. In at least one embodiment, the transistors N1 and N2 arep-channel metal-oxide semiconductor (PMOS) transistors.

The second portion 214 of the conductive pattern 210 and the conductivepattern 220 divide the active area pattern 240 into regions 242, 244 and246. The regions 244 and 246 of the active area pattern 240 are arrangedon opposite sides of the conductive pattern 220, and are configured toform corresponding drain D1 and source S1 of the transistor N1. A gateG1 of the transistor N1 is configured by the conductive pattern 220. Aconductor SG (also referred to herein as a selector gate SG) is arrangedin the conductive pattern 220 to provide an electrical connection fromthe gate G1 of the transistor N1 to a selector line, such as acorresponding one of the selector lines S0-Sj described with respect toFIG. 1, for programing and/or reading memory cell 201. A conductor SL(also referred to herein as a source line SL) is arranged in the region246 to provide an electrical connection from the source S1 of thetransistor N1 to a source line, such as a corresponding one of thesource lines SL0-SLj described with respect to FIG. 1, for programingand/or reading memory cell 201.

The regions 242 and 244 of the active area pattern 240 are arranged onopposite sides of the second portion 214 of the conductive pattern 210,and are configured to form corresponding drain D2 and source S2 of thetransistor N2. A gate G2 of the transistor N2 is a floating gateconfigured by the second portion 214 of the conductive pattern 210. Aconductor BL (also referred to herein as a bit line BL) is arranged inthe region 242 to provide an electrical connection from the drain D2 ofthe transistor N2 to a bit line, such as a corresponding one of the bitlines BL0-BLk described with respect to FIG. 1, for programing and/orreading memory cell 201. The region 244 of the active area pattern 230is arranged between the gates G1 and G2 of the transistors N1 and N2,and is configured to form both the drain D1 of the transistor N1 and thesource S2 of the transistor N2. As a result, the transistor N1 andtransistor N2 are serially coupled.

The active area pattern 250 has the same type of dopants as thecorresponding well region NW1. For example, both the active area pattern250 and the corresponding well region NW1 include n-type dopants. Theactive area pattern 250 and the well region NW1 having the same type ofdopants are configured to form a first electrode of a capacitor C_(WL).A second electrode of the capacitor C_(WL) is configured by the firstportion 212 which extends over the active area pattern 250 and wellregion NW1. The first portion 212 overlaps the active area pattern 250and well region NW1 in an overlapping area which determines acapacitance of the capacitor C_(WL). The active area pattern 250includes regions 252 and 254 on opposite sides of the first portion 212of the conductive pattern 210. A conductor WL (also referred to hereinas a word line WL) is arranged in the region 254 to provide anelectrical connection from the first electrode of the capacitor C_(WL)to a word line, such as a corresponding one of the word lines WL0-WLjdescribed with respect to FIG. 1, for reading and/or programing thememory cell 201. The conductors EG, SG, SL, BL, WL of the memory cell201 and corresponding conductors (e.g., SG′ and BL′) of the memory cell202 are schematically illustrated in FIG. 2A with the label “CT.”

In some embodiments, the capacitance of the capacitor C_(WL) isconfigured to be larger than the capacitance of the capacitor C_(EG),i.e., C_(WL)>C_(EG). To achieve the relationship C_(WL)>C_(EG), in atleast one embodiment, the area in which the conductive pattern 210extends over the active area pattern 250 and the corresponding wellregion NW1 is configured to be larger than the area in which theconductive pattern 210 extends over the active area pattern 230 and thecorresponding well region NW2. In the example configuration in FIG. 2A,when seen along an elongation direction of the active area pattern 230(i.e., the direction transverse to the axis Z), a width W1 of the firstportion 212 of the conductive pattern 210 over the active area pattern250 is greater than a width W3 of the third portion 216 of theconductive pattern 210 over the active area pattern 230. In addition,when seen along the elongation direction of the active area pattern 230,a width W2 of the second portion 214 of the conductive pattern 210 overthe active area pattern 240 is smaller than the width W1 and is greaterthan the width W3. Other arrangements for achieving the relationshipC_(WL)>C_(EG) are within the scope of various embodiments.

In the example configuration in FIG. 2A, the well region PW shares aborder with the well region NW1, and the well region PW is spaced, by aspacing Sp, from the well region NW2. In some embodiments, the spacingSp is configured to reduce the chances of a junction breakdown. Otherarrangements are within the scope of various embodiments.

FIG. 2B is a partial cross-sectional view taken along lineA1-A2-A3-A4-A5-A6 in FIG. 2A and shows the memory cell 201 in accordancewith some embodiments. The memory cell 202 is omitted in the partialview of FIG. 2B. The memory cell 201 comprises a substrate 260 overwhich the components of the memory cell 201 as described with respect toFIG. 2A are. Specifically, the well regions NW1, PW and NW2 are in thesubstrate 260. The regions 232 and 234 are in the well region NW1, theregions 242, 244 and 246 are in the well region PW, and the regions 252and 254 are in the well region NW1. The regions 232, 234, 242, 244, 246,252 and 254 are n+ doped regions. The first through third portions 212,214 and 216 of the floating gate FG are over the corresponding wellregions NW1, PW and NW2. The conductive pattern 220 is over the wellregion PW. The floating gate FG and the conductive pattern 220 belong tothe same conductive layer, which, in at least one embodiment, includes asingle polysilicon layer over the substrate 260. A gate oxide layer (notshown) is between the substrate 260 and the single polysilicon layer.The region 234 is coupled to the erase gate EG. The region 246 iscoupled to the source line SL and is designated as the source of thememory cell 201. The region 242 is coupled to the bit line BL and isdesignated as the drain of the memory cell 201. The region 254 iscoupled to the word line WL.

Example materials of the substrate 260 include, but are not limited to,silicon germanium (SiGe), gallium arsenic, or other suitablesemiconductor materials. In at least one embodiment, the substrate 260is a p-type substrate. Example materials of the gate oxide layerinclude, but are not limited to, a high-k dielectric layer, aninterfacial layer, and/or combinations thereof. Example materials forthe high-k dielectric layer include, but are not limited to, siliconnitride, silicon oxynitride, hafnium oxide (HfO₂), hafnium silicon oxide(HfSiO), hafnium silicon oxynitride (HfSiON), hafnium tantalum oxide(HfTaO), hafnium titanium oxide (HfTiO), hafnium zirconium oxide(HfZrO), metal oxides, metal nitrides, metal silicates, transitionmetal-oxides, transition metal-nitrides, transition metal-silicates,oxynitrides of metals, metal aluminates, zirconium silicate, zirconiumaluminate, zirconium oxide, titanium oxide, aluminum oxide, hafniumdioxide-alumina (HfO₂—Al₂O₃) alloy, other suitable high-k dielectricmaterials, and/or combinations thereof. In some embodiments, the memorycell 201 further includes one or more additional features (not shown)including, but not limited to, isolation structures, spacers, silicidedregions, one or more gate metal layers, lightly doped source/drain (LDD)regions, and inter-layer dielectric (ILD) layers. In at least oneembodiment, one or more of the described layers and/or describedcomponents of the memory cell 201 are formed by one or moresemiconductor manufacturing processes, including, but not limited to,photolithography, etching, planarization, ion implantation, various filmdeposition techniques, and the like. In an example manufacturing processin accordance with some embodiments, the well regions NW1 and NW2 areformed in the substrate 260 by, e.g., ion implantation of an n-typedopant into the substrate 260. Example n-type dopants include, but arenot limited to, phosphorous, arsenic, antimony, and combinationsthereof. The well region PW is formed in the substrate 260 by, e.g., ionimplantation of a p-type dopant into the substrate 260. Example p-typedopants include, but are not limited to, boron, indium, and combinationsthereof. A dielectric layer is formed over the well regions NW1, NW2 andPW. A conductive layer is formed over the dielectric layer. Theconductive layer and the dielectric layer are patterned, e.g., byphotolithography and etching processes, to form the conductive patterns210, 220 and the corresponding gate oxide layers between the conductivepatterns 210, 220 and the substrate 260. The regions 232, 234, 242, 244,246, 252 and 254 are formed in the corresponding well regions NW2, PWand NW1 by, e.g., ion implantation of an n-type dopant into thecorresponding well regions. The conductors BL, WL, SL and EG are formedover the corresponding regions 242, 254, 246 and 234, and the conductorSG is formed over the conductive pattern 220. Example materials of theconductors BL, WL, SL, EG, and SG include, but are not limited to,aluminum, aluminum/silicon/copper alloy, titanium, titanium nitride,tungsten, polysilicon, metal silicide, copper, copper alloy, titanium,titanium nitride, tantalum, tantalum nitride, tungsten, polysilicon,metal silicide, or combinations thereof.

The n+ doped regions 252, 254 in the n-well region NW1 are configured toform, together with the first portion 212 of the floating gate FG, ann-type capacitor C_(WL). The n+ doped regions 232, 234 in the n-wellregion NW2 are configured to form, together with the third portion 216of the floating gate FG, an n-type capacitor C_(EG). The n+ dopedregions 246, 244 in the p-well region PW are configured to form,together with the conductive pattern 220 coupled to the selector gateSG, a selector transistor N1 which is an NMOS. The n+ doped regions 244,242 in the p-well region PW are configured to form, together with thesecond portion 214 of the floating gate FG, a storage transistor N2which is an NMOS having a floating gate.

In the example configuration in FIG. 2B, the well region PW shares aborder with the well region NW1. Other arrangements are within the scopeof various embodiments. In the example configuration in FIG. 2B, thewell region PW is spaced from the well region NW2 by a portion 262 ofthe substrate 260. The portion 262 in one or more embodimentscorresponds to the spacing Sp described with respect to FIG. 2A. In somesituations, when the well region PW shares a border with the well regionNW2, a p-n junction exists between the well region PW and the wellregion NW2. Such p-n junction has a breakdown voltage of about 15 V insome situations. During operation of the memory cell, when a voltagehigher than the breakdown voltage of the p-n junction is applied acrossthe p-n junction, there is a potential risk that the p-n junction willbe damaged. An example situation when a voltage higher than thebreakdown voltage of the p-n junction is applied across the p-n junctioninvolves an erase operation in which a high voltage, e.g., 20 V-30 V, isapplied to the well region NW2 via the erase gate EG and the groundvoltage is applied to the well region PW (as a bulk voltage) and/or tothe source S1 (as a source line voltage). To reduce the potential riskassociated with such high voltages, the portion 262 of the substrate 260is maintained (i.e., not doped when dopants are implanted into the wellregion NW2 and the well region PW) between the well region PW and thewell region NW2. Other arrangements for reducing a likelihood of apotential breakdown between the well region PW and the well region NW2are within the scope of various embodiments. For example, in one or moreembodiments, an isolation structure, such as a shallow trench isolation(STI) region, is formed between the well region PW and the well regionNW2. In at least one embodiment, when an isolation structure is formed,such an isolation structure is as deep as at least one of the wellregion PW or the well region NW2.

FIG. 2C is a circuit diagram of the memory cell 201 in FIG. 2B, inaccordance with some embodiments. The memory cell 201 has atwo-transistor-two-capacitor (2T2C) configuration and comprises twotransistors and two capacitors. The two transistors include thetransistor N1 which is a selector transistor, and the transistor N2which is a storage transistor. The two capacitors include the capacitorC_(WL) for capacitive coupling between the floating gate FG and the wordline WL, and the capacitor C_(EG) for capacitive coupling between thefloating gate FG and the erase gate EG. The transistor N1 has the gateG1 coupled to the selector gate SG, the source S1 coupled to the sourceline SL, and the drain D1 coupled to the source S2 of the transistor N2.The transistor N2 has a floating gate configured by the second portion214 of the floating gate FG, and the drain D2 coupled to the bit lineBL. The capacitor C_(WL) has a first electrode configured by the wellregion NW1 coupled to the word line WL, and a second electrodeconfigured by the first portion 212 of the floating gate FG. Thecapacitor C_(EG) has a first electrode coupled to the erase gate EG, anda second electrode configured by the third portion 216 of the floatinggate FG.

In operation of the memory cell 201 in accordance with some embodiments,a voltage V_(D) is applied via the bit line BL to the drain of thememory cell 201 (i.e., the drain D2 of the transistor N2). A voltageV_(S) is applied via the source line SL to the source of the memory cell201 (i.e., the source S1 of the transistor N1). A voltage V_(SG) isapplied via the selector gate SG to the gate G1 of the transistor N1. Avoltage V_(WL) is applied to the word line WL, resulting in a voltageV_(NW1) in the well region NW1 which is transferred via the capacitivecoupling of the capacitor C_(WL) to the floating gate FG. A voltageV_(EG) is applied to the erase gate EG, resulting in a voltage V_(NW2)in the well region NW2 which is transferred via the capacitive couplingof the capacitor C_(EG) to the floating gate FG. A bulk voltage V_(B) isapplied to the bulk of the transistor N1 and transistor N2, i.e., to thewell region PW. In some embodiments, by controlling one or more of thevoltages V_(D), V_(WL), V_(SG), V_(EG), V_(S) and V_(B), the memory cell201 is programed, read, erased or unselected during a program operation,a read operation or an erase operation of one or more other memory cellsin the memory device.

Operation conditions of the memory cell 201 in accordance with someembodiments are summarized in the below Table.

TABLE Operation V_(WL) Condition V_(D) (=V_(NW1)) V_(SG) V_(EG)(=V_(NW2)) V_(S) V_(B) Program >V_(S) >V_(S) >V_(S) =V_(WL) or 0 V >=0V   0 V Erase 0 V 0 V 0 V >>V_(WL) 0 V 0 V Read >V_(S) >V_(S) >V_(S)=V_(WL) or 0 V 0 V 0 V

In a program operation in accordance with some embodiments, V_(WL) andV_(SG) are greater than V_(S) to turn ON the corresponding transistor N1and transistor N2. V_(D) is greater than V_(S) to create a sufficientlystrong electric field that causes channel hot electron (CHE) injectionin which hot electrons travel toward the drain and are injected intofloating gate FG, changing a threshold voltage of the memory cell 201and storing a datum in the transistor N2. The voltage of the floatinggate FG is controlled by V_(WL). V_(EG) is controlled to be betweenV_(WL) and zero to reduce influence of V_(EG) on the voltage of thefloating gate FG. V_(S) is controlled to be greater than or equal tozero. Compared to other approaches which use a non-zero V_(S) during aprogram operation involving CHE injection, at least one embodimentpermits V_(S) to be zero during a program operation. As a result, powerconsumption and/or control complexity is reduced.

In an erase operation in accordance with some embodiments, all voltagesother than V_(EG) are zero. V_(EG) is controlled to create asufficiently strong electric field between the erase gate EG and theword line WL for causing electrons to be discharged from the floatinggate FG by using the Fowler-Nordheim (F-N) tunneling effect. Thedescribed erase operation involves application of a sufficient voltageacross the erase gate EG and the word line WL. Compared to otherapproaches where other mechanisms, such as Drain Avalanche Hot HoleInjection (DAHHI), and/or other voltage control schemes are used inerase operations, the erase operation in one or more embodiments issimpler and reduces power consumption and/or control complexity.

In a read operation in accordance with some embodiments, V_(WL) andV_(SG) are greater than V_(S) to turn ON the corresponding transistor N1and transistor N2. A read current flows through the transistor N1 andtransistor N2. A level of the read current indicates the datum stored inthe transistor N2. For example, when logical “0” is stored, the readcurrent is higher than when logical “1” is stored. By sensing the readcurrent, the datum stored in the transistor N2 is read out.

One or more reasons for configuring the capacitor C_(WL) to have alarger capacitance than the capacitor C_(EG) in accordance with someembodiments are described herein. The total capacitance C_(Total) of thefloating gate FG is determined as follows:C _(Total) =C _(EG) +C _(CELL) +C _(WL)

where C_(CELL) is a parasitic capacitor in the transistor N2. In someembodiments, C_(CELL) is omitted.

The effective bias V_(FG) on the floating gate FG is determined asfollowsV _(FG) =V _(EG) *CR_EG+V _(WL) *CR_WL+Q _(FG) /C _(total)

where CR_EG is a coupling ratio on the erase gate EG andCR_EG=C_(EG)/C_(Total),

CR_WL is a coupling ratio on the word line WL andCR_WL=C_(WL)/C_(Total), and

Q_(FG) is the amount of charges stored in the floating gate FG.

When C_(WL) is larger than C_(EG), CR_WL is larger than CR_EG. As aresult, V_(FG) depends more strongly on V_(WL) than V_(EG). The greaterthe ratio C_(WL)/C_(EG), the more strongly V_(FG) depends on V_(WL). Insome embodiments, the ratio C_(WL)/C_(EG) is in a range from 10:1 to20:1. In at least one embodiment, the ratio C_(WL)/C_(EG) in the rangefrom 10:1 to 20:1 provides one or more effects including, but notlimited to, reasonable cell size and electrical performance.

When V_(FG) depends strongly on V_(WL), a gate bias in the memory cell201 is controlled substantially by V_(WL) on the word line WL, withinsignificant influences from the erase gate EG, which is advantageousin some embodiments for the program and/or read operations.

In some situations, during an erase operation, the efficiency of the F-Ntunneling depends on the bias difference between V_(EG) and V_(FG). WhenV_(FG) depends strongly on V_(WL), then V_(FG)˜V_(WL). In an eraseoperation in accordance with some embodiments, V_(WL) is zero and V_(FG)is close to zero. As a result, the efficiency of the erase operation, insome embodiments, is substantially controlled by V_(EG) on the erasegate EG.

FIG. 3 is a cross-sectional view similar to FIG. 2B, and shows a memorycell 300 in accordance with some embodiments. Compared to the memorycell 201 in FIG. 2B, the capacitor C_(WL) and the capacitor C_(EG) inthe memory cell 300 include p-type capacitors, instead of n-typecapacitors as in the memory cell 201. One electrode of the capacitorC_(WL) is configured by the first portion 212 of the floating gate FG.The other electrode of the capacitor C_(WL) is configured by a p-wellregion PW1 in the well region NW1. P+ doped regions 352, 354 are in thewell region PW1. One of the regions 352, 354 is coupled to the word lineWL. For example, the region 354 is coupled to the word line WL. In atleast one embodiment, the regions 352, 354 and the well region PW1correspond to the regions 252, 254 and the well region NW1 in the memorycell 201. One electrode of the capacitor C_(EG) is configured by thethird portion 216 of the floating gate FG. The other electrode of thecapacitor C_(EG) is configured by a p-well region PW2 in the well regionNW2. P+ doped regions 332, 334 are in the well region PW2. One of theregions 332, 334 is coupled to the erase gate EG. For example, theregion 334 is coupled to the erase gate EG. In at least one embodiment,the regions 332, 334 and the well region PW2 correspond to the regions232, 234 and the well region NW2 in the memory cell 201. In the exampleconfiguration of FIG. 3, the well regions PW, PW1 and PW2 have the samedepth and/or formed in the same ion implantation process. Otherarrangements are within the scope of various embodiments. The memorycell 300 operates and achieves one or more effects as described hereinwith respect to the memory cell 201.

In some embodiments, the well region PW, well region PW1 and well regionPW2 are implemented as separate p-wells, and/or the well region NW1 andthe well region NW2 are implemented as separate n-wells. In someembodiments, the well region PW, well region PW1 and well region PW2 areimplemented by a single p-well, and/or the well region NW1 and the wellregion NW2 are implemented by a single n-well.

FIG. 4 is a cross-sectional view similar to FIG. 2B, and shows a memorycell 400 in accordance with some embodiments. Compared to the memorycell 201 in FIG. 2B, the memory cell 400 includes a single n-well NWthat includes both a well region 433 corresponding to the third portion216 of the floating gate FG, and a well region 435 corresponding to thefirst portion 212 of the floating gate FG. In at least one embodiment,in a view similar to the layout in FIG. 2A, a boundary of the n-well NWextends continuously around the well region PW. The memory cell 400operates and achieves one or more effects as described herein withrespect to the memory cell 201.

FIG. 5 is a cross-sectional view similar to FIG. 2B, and shows a memorycell 500 in accordance with some embodiments. Compared to the memorycell 300 in FIG. 3, the memory cell 400 includes a single n-well NW anda single p-well PW. The n-well NW includes both the well region 433corresponding to the third portion 216 of the floating gate FG, and thewell region 435 corresponding to the first portion 212 of the floatinggate FG, as described with respect to FIG. 4. The p-well PW includes awell region 551 corresponding to the third portion 216 of the floatinggate FG, a well region 553 corresponding to the second portion 214 ofthe floating gate FG and the selector gate SG, and a well region 555corresponding to the first portion 212 of the floating gate FG. Thememory cell 500 operates and achieves one or more effects as describedherein with respect to the memory cell 201.

The described configurations for a memory device and/or a memory celland/or a layout of a memory cell are examples. Other arrangements arewithin the scope of various embodiments. For example, in someembodiments, the two transistors in a memory cell having a 2T2Cconfiguration are PMOS transistors. In some embodiments, one of thecapacitors in a memory cell having a 2T2C configuration is an n-typecapacitor, and the other capacitor is a p-type capacitor.

Embodiments that combine different features and/or different embodimentsare within the scope of the disclosure and will be apparent to those ofordinary skill in the art after reviewing various embodiments.

Some embodiments provide a 2T2C configuration for a memory cell. In a2T2C memory cell in accordance with some embodiments, a floating gate ofone of the transistors is also configured as electrodes of the twocapacitors, for capacitive coupling with a word line and an erase gate.A 2T2C memory cell in accordance with some embodiments is configured tobe programed by CHE injection and erased by F-N tunneling, in a mannersimpler than other approaches. In at least one embodiment, the twotransistors are NMOS transistors, and the two capacitors are eithern-type or p-type capacitors. Such a configuration, in at least oneembodiment, is compatible with advanced manufacturing processes, forexample, at 55 nm and smaller.

One aspect of this description relates to a memory device includes atleast one memory cell. The memory cell comprises first and secondtransistors, and first and second capacitors. The first transistor iscoupled to a source line. The second transistor is coupled to the firsttransistor and a bit line. The first capacitor is coupled to a word lineand the second transistor. The second capacitor is coupled to the secondtransistor and an erase gate.

Another aspect of this description relates to a memory cell. The memorycell includes a first transistor in a first well, wherein the first wellhas a first dopant type. The memory cell further includes a secondtransistor in the first well. The memory cell further includes a firstcapacitor in a second well, wherein the second well has a second dopanttype different from the first dopant type. The memory cell furtherincludes a second capacitor in a third well, wherein the third well hasthe second dopant type. The memory cell further includes a word linecoupled to the first capacitor; a source line coupled to the firsttransistor; and a bit line coupled to the second transistor.

Still another aspect of this description relates to a memory cell. Thememory cell includes a substrate and a first transistor in a first well,wherein the first well has a first dopant type, and the first well is inthe substrate. The memory cell further includes a second transistor inthe first well. The memory cell further includes a first capacitor in asecond well, wherein the second well has a second dopant type differentfrom the first dopant type, and the second well is in the substrate. Thememory cell further includes a second capacitor in a second well. Thememory cell further includes a word line coupled to the first capacitorand an erase gate coupled to the second capacitor. The memory cellfurther includes a source line coupled to the first transistor and a bitline coupled to the second transistor.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A memory cell comprising: a first transistorcoupled to a source line, wherein the first transistor is in a firstwell; a second transistor coupled to the first transistor and a bitline, wherein the second transistor is in the first well; a firstcapacitor coupled to a word line and the second transistor, wherein thefirst capacitor is in a second well; and a second capacitor coupled tothe second transistor and an erase gate, wherein the second capacitor isin a third well.
 2. The memory cell of claim 1, wherein the secondtransistor comprises a floating gate, and the first capacitor and thesecond capacitor are coupled to the floating gate.
 3. The memory cell ofclaim 1, wherein a capacitance of the first capacitor is greater than acapacitance of the second capacitor.
 4. The memory cell of claim 1,wherein the at least one memory cell is configured to be programed bychannel hot electron (CHE) injection and is configured to be erased byFowler-Nordheim (F-N) tunneling.
 5. The memory cell of claim 1, whereinat least one of the first capacitor or the second capacitor is an n-typecapacitor.
 6. The memory cell of claim 1, wherein at least one of thefirst capacitor or the second capacitor is a p-type capacitor.
 7. Thememory cell of claim 1, wherein the first well is spaced from the thirdwell.
 8. The memory cell of claim 1, wherein the second well iscontinuous with the third well.
 9. A memory cell comprising: a firsttransistor in a first well, wherein the first well has a first dopanttype; a second transistor in the first well; a first capacitor in asecond well, wherein the second well has a second dopant type differentfrom the first dopant type, and the first well is in direct contact withthe second well; a second capacitor in a third well, wherein the thirdwell has the second dopant type; a word line coupled to the firstcapacitor; a source line coupled to the first transistor; and a bit linecoupled to the second transistor.
 10. The memory cell of claim 9,further comprising a first sub-well in the second well, wherein thefirst sub-well has the first dopant type, and the first capacitor is inthe first sub-well.
 11. The memory cell of claim 9, further comprising afirst sub-well in the third well, wherein the first sub-well has thefirst dopant type, and the second capacitor is in the first sub-well.12. The memory cell of claim 9, wherein a depth of the first well isdifferent from a depth of the second well.
 13. The memory cell of claim9, wherein a depth of the first well is substantially equal to a depthof the second well.
 14. The memory cell of claim 9, further comprisingan erase gate coupled to the second capacitor.
 15. The memory cell ofclaim 9, wherein the first capacitor is coupled to a gate of the secondtransistor.
 16. A memory cell comprising: a substrate; a firsttransistor in a first well, wherein the first well has a first dopanttype, and the first well is in the substrate; a second transistor in thefirst well; a first capacitor in a second well, wherein the firstcapacitor is coupled to a gate of the second transistor, the second wellhas a second dopant type different from the first dopant type, and thesecond well is in the substrate; a second capacitor in a third well; aword line coupled to the first capacitor; an erase gate coupled to thesecond capacitor; a source line coupled to the first transistor; and abit line coupled to the second transistor.
 17. The memory cell of claim16, wherein the second well surrounds the first well.
 18. The memorycell of claim 16, wherein a first side of the first well directlycontacts a side of the second well.
 19. The memory cell of claim 18,wherein a second side of the first well is separated from the secondwell by a portion of the substrate.
 20. The memory cell of claim 16,wherein the substrate has the first dopant type.